ENOVIA v6R2012

Description

V6R2012x continues to improve collaborative innovation in heterogeneous environments. Designers can create in real time a single virtual product in V6 made of CATIA V6, CATIA V5, SolidWorks and, new with this release, PTC Pro/Engineer and Siemens NX data. This streamlines the end-to-end design process, enabling users to identify errors earlier and reduce associated costs. Designers using ENOVIA V6 to manage their SolidWorks data benefit from tighter data management integration, making the overall user experience simpler and more productive. These highlights, in conjunction with the xPDM framework announced in June with V6R2012, reinforce the openness of the V6 platform in support of end-to-end design and collaborative business processes. V6R2012x is increasingly being adopted across a broader range of user communities by simplifying the user experience with the latest user interface and Internet technologies and expanded scope of language support with the introduction of Chinese. A smooth and robust migration path from pre-existing 3DS solutions to V6 is critical for our customers and is supported by our co-existence and migration strategy, which was established at the onset of V6. In V6R2012x, we continue to advance this strategy by delivering the ability to deploy DMU V6 as a supplemental solution to an existing V4/V5 design process, improved design collaboration with 2D drawings in VPM V4 and VPM V5, better support of multi-represented parts in V5-V6 design collaborations or V5-V6 supply chain scenarios, advanced support of relational design, and improved deployment and administration with better reporting. Reach New Users, Industries and Extend Scenarios’ Scope V6R2102x continues to deliver best-in-class configuration management capabilities to help companies create and manage configured products and maximize reuse. V6R2102x reinforces V6 configuration management with a more scalable architecture supporting a master view of product capabilities to maintain brand integrity across product lines and process domains. It increases flexibility as a product’s variability matures over time and streamlines the process by separating the product’s marketing define activities and feature-option definition from the system engineering activities during the logical product architecture phase. In addition, V6R2012x supports the definition and filtering of requirements in the context of configured products for full traceability. It also enables the creation and edition of a configured EBOM in development mode for improved collaboration during the early design phase. Improve Usability, Performance and TCO V6R2012x continues to improve usability, performance and overall TCO globally and in specific industry solutions. In particular, the industry leading semiconductor data management solution delivers numerous enhancements to speed exchange of large data sets across multiple sites and tighten integration with leading EDA tools such as Synopsis Custom Designer. Integrated circuit designers will appreciate powerful new capabilities to graphically compare binary design data, resolve conflicts in textual data which can occur in parallel development design methodologies, and explore design alternatives in the context of hierarchical designs. Finally, V6R2012x reinforces our key benefit of a lower total cost of ownership by delivering increased adoption of ENOVIA’s OOTB strategy for ease of deployment. CATIA V5 customers can now take advantage of the out-of-the-box setup (TEAM) available in both V6 PLM Express and V6 portfolios. For rapid implementation, customers can start with V6 PLM Express and upgrade to the full V6 platform later if necessary, while combining CATIA V5 and CATIA V6 designs in the same environment. This release also improves indexing and installation capabilities, reducing storage requirements and simplifying the installation process.

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