Mentor Graphics Calibre 2014.4


At nanometer nodes, design signoff is no longer just DRC and LVS. These basic components of physical verification are being augmented by an expansive set of yield analysis and critical feature identification capabilities, as well as layout enhancements, and printability and performance validation, all of which Mentor addresses with the DFM tools of the Calibre nm Platform. Building on our powerful, production-proven Hyperscaling architecture, we deliver the broadest, most accurate, and best performing DFM solutions in the industry. Because the Calibre platform is built on standard open database interfaces, it brings production-proven DFM capabilities to our customers independent of the design creation environment they use.


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